- All sections
- C - Chemistry; metallurgy
- C23F - Non-mechanical removal of metallic material from surfaces; inhibiting corrosion of metallic material; inhibiting incrustation in general; multi-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass or or class
- C23F 1/12 - Gaseous compositions
Patent holdings for IPC class C23F 1/12
Total number of patents in this class: 181
10-year publication summary
15
|
20
|
9
|
18
|
19
|
16
|
12
|
22
|
12
|
4
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Applied Materials, Inc. | 16587 |
20 |
Tokyo Electron Limited | 11599 |
19 |
ASM IP Holding B.V. | 1715 |
19 |
Central Glass Company, Limited | 1244 |
11 |
Lam Research Corporation | 4775 |
6 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
5 |
Beijing NMC Co., Ltd. | 113 |
5 |
Beijing E-town Semiconductor Technology, Co., Ltd | 246 |
4 |
BASF SE | 19740 |
3 |
Centre National de La Recherche Scientifique | 9632 |
3 |
Headway Technologies, Inc. | 715 |
3 |
Showa Denko K.K. | 2539 |
3 |
National Oilwell Varco, L.P. | 1604 |
3 |
The Regents of the University of Colorado, a body corporate | 2430 |
3 |
Tokyo Electron U.S. Holdings, Inc | 608 |
3 |
Hitachi High-Tech Corporation | 4424 |
3 |
Robert Bosch GmbH | 40953 |
2 |
Semiconductor Energy Laboratory Co., Ltd. | 10902 |
2 |
Varian Semiconductor Equipment Associates, Inc. | 1282 |
2 |
Medtronic Vascular, Inc. | 1529 |
2 |
Other owners | 60 |